Research Professor | University Industry Collaboration
Artificial Intelligence (AI) Convergence Research Center, Inha University
+82-10-4239-0283, bjeon2k@inha.ac.kr
EDUCATION
□ Seoul National University Seoul, Korea
Ph.D. in Electrical and Computer Engineering Mar. 1996 – Feb. 2004
□ Seoul National University Seoul, Korea
M.S. in Control & Instrumentation Engineering Mar. 1988 – Feb. 1990
□ Seoul National University Seoul, Korea
B.S. in Control & Instrumentation Engineering Mar. 1984 – Feb. 1988
WORK EXPERIENCE
□ Artificial Intelligence (AI) Convergence Research Center, Inha University [2021 - Present]
⊙ Professor (University-Industry Collaboration): 2021 – Present
□ Electrical & Computer Engineering, Seoul National University [2019 - 2020]
⊙ Professor (University-Industry Collaboration): 2019 – 2020 (2 years)
□ Mechatronics R&D Center, Samsung Electronics Co., Ltd. [1990 – 2018]
⊙ Master: 2011 – 2018 (8 years)
⊙ Principal Engineer: 2003 – 2010 (8 years)
⊙ Senior Engineer: 1995 – 2002 (8 years)
⊙ Junior Engineer: 1992 – 1994 (3 years)
⊙ Assistant Engineer: 1990 – 1991 (2 years)
EXPERTISES in Equipment and Software Technology Development
□ Stand-alone metrology & inspection equipment for manufacturing semiconductors, such as
Optical Defect Review System, Defect Review SEM (Scanning Electron Microscope), Macro
Defect Inspection System, Nano Defect Inspection System, Scanning Probe Microscope,
Microscopic Hyper-spectral Inspection System, EUV (Extreme Ultraviolet) Mask Defect
Review System, and EUV Mask CD (Critical Dimension) & Reflectance Measurement System
□ Metrology & inspection software server technologies for manufacturing semiconductors,
such as Image-based Inspection Software Server, Spectrum-based Optical CD Measurement
Software Server, and Automatic TEM (Transmission Electron Microscope) Image
Measurement Software Server
□ Integrated metrology & inspection technologies for manufacturing semiconductors, such as
Spinner Macro Defect Detection, In-situ Measurement of CMP (Chemical Mechanical
Polishing) Pad Profile, CMP Macro Defect Detection, In-situ Measurement of Particles in
CMP Clean Bath; Thickness Measurement for Etch, CVD (Chemical Vapor Deposition), and
CMP Process; Measurement of Particles in Chemical Liquids, Concentration Measurement
for CCSS (Central Chemical Supply System), Particle Measurement of NPW (Non-Pattern
Wafer), and Particle Inspection for Mask Manufacturing Process Equipment
□ Metrology & inspection equipment technologies for manufacturing LCD (Liquid Crystal Display),
such as Automated Optical Inspection, Automatic Visual Tester of TFT (Thin Film Transistor)
Process, Automatic Module Tester of Module Assembly Process, and Automatic Final Tester of
Final Assembly Process
□ Metrology & inspection software technologies for manufacturing LCD, such as Recipe
Management System, Real-time Defect Tracking System from TFT Process to Final Assembly
Process, Detection of Local Non-Uniformity Defects in Photo-Lithography Process, and
Automatic Local Non-Uniformity Compensation at Liquid Crystal Process & Module
Assembly Process
□ Metrology & inspection technologies for manufacturing home appliance products, such as
TV Panel Inspection System, Parts Inspection Systems for Vacuum Cleaners, Automatic Cloth
Washers, and Automatic Air Conditioners
□ Core technologies for metrology & inspection equipment and software, such as Pattern
Analysis & Classification, Computer Vision, General Image Processing Algorithms, Machine
Learning, Electronic & Electrical High-Speed Circuit Design, Analog & Digital Signal
Processing, Equipment Control & Operational Software, Optical System Design, Opto-
mechanical System Design, Computational Imaging, Spectroscopy, Microscopy, Optical
Information Processing, and Mechanical System Design
JOURNAL PUBLICATIONS
□ Face detection using the 1st-order RCE classifier, EURASIP Journal on Applied Signal
Processing, 2003
□ Augmentation of defect image data using GAN, Journal of the Institute of Electronics and
Information Engineers, volume 59, pages 98-108, October 2022, South Korea.
□ Synthesizing industrial defect images under data imbalance, IEEE Access, volume 11,
pages 111335-111346, October 2023
CONFERENCE PRESENSTATIONS and TALKS
□ Performance analysis on polygonal approximation algorithms, Signal Processing Workshop,
1988, South Korea
□ A Real-Time Implementation of the Vision System for SMT Automation,
Journal of the Institute of Electronics and Information Engineers 27(6), 1990, South Korea
□ Robot Controller With 32-Bit DSP Chip,
Workshop of The Institute of Electronics and Information Engineers, 1991, South Korea
International Federation of Automatic Control, 1992, South Korea
□ Rotation invariant face detection using a model-based clustering algorithm,
IEEE International Conference on Multimedia and Expo, 2000, USA
□ A study on image quality enhancement techniques for PCB X-ray images,
Workshop on Advanced Manufacturing System, 2002, South Korea
□ Face detection using the 1st-order RCE classifier, IEEE International Conference
on Image Processing, 2002, Canada
□ PCB Inspection using X-ray imaging, Workshop on Image Processing, 2003, South Korea
□ Augmentation of defect image data using GAN, 34th Workshop on Image Processing and
Image Understanding, Feb. 2022, South Korea
□ StyleGAN based data augmentation to alleviate defect image data imbalance, Summer
Annual Conference on the Institute of Electronics and Information Engineers, Jun. 2022, South Korea
□ Comparing defect image classification methods, Summer Annual Conference on the
Institute of Electronics and Information Engineers, Jun. 2022, South Korea.
AWARDS and HONORS
□ The Annual Award for Excellent Engineers, Jan. 2005
□ The Annual Samsung Proud People Awards for Technology, Dec. 2012
□ The Awards for Future Creators of Device Solutions, Oct. 2014
CERTIFICATIONS
□ Green Belt of 6 Sigma
□ Black Belt of 6 Sigma
SKILLS
□ Computer Programming Language: C, C++, Java
PATENTS
□ United States (Keywords: Byeong Hwan Jeon @ patents.justia.com): 35 Articles
□ Korea (Keywords: “전병환*삼성전자” @ www.kipris.or.kr): 46 Articles (등록 + 소멸)
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